Tegal
903
The Tegal 903 ACS is a diode plasma etch tool. The Tegal 903 ACS has a wafer size range of 3", 100mm – 150mm. The Tegal 903 ACS is suited to plasma etch of silicon oxide and silicon nitride materials.[1]
How it works
Where it fits in the process flow
What can it run?
Process applications and technology nodes documented for this tool.
- non-critical via etch
- pad passivation etch
- oxide contact/via etch
- LDD spacer etch
- polyimide ILD etch
- resist/SOG planarization
- etching oxide contacts
- production of memory chips
- production of data communication ICs
- production of microcontrollers
- production of multimedia ICs
- production of power management devices
What do the numbers mean?
Power & electrical2
- Reactors/materials
- narrow gap RF diode reactor; plasma etch of silicon oxide and silicon nitride materials[1]
Wafer handling6
Configuration & options3
Vintage & configurations
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of reactor does the Tegal 903 use?
The Tegal 903 uses a narrow gap RF diode reactor.[1]
What are typical applications for the Tegal 903?
Typical applications include pad passivation etch, oxide contact/via etch (down to 0.8 micron), LDD spacer etch, polyimide ILD etch, and resist/SOG planarization. The system is also used for MEMS, advanced packaging, thin film head, and Bio-Chip nanotechnology.[1][3]
Not publicly documented
The following facts about the 903 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 903 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the 903 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 903 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 903 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 903 are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]web.archive.org — web.archive.orgweb.archive.org
- [2]web.archive.org — web.archive.orgweb.archive.org
- [3]web.archive.org — web.archive.orgweb.archive.org
Last updated Oct 5, 2026.
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