Tegal
980
The Tegal 980 ACS is a plasma etch system. The Tegal 980 ACS serves 200mm wafers. The Tegal 980 ACS is a cassette-to-cassette etch system.[1][2]
Wafer size
200mm
Performance
Faster throughput[1]
What it is
How it works
Where it fits in the process flow
The Tegal 980 ACS series serves 200mm fab lines.[1]
Applications
The Tegal 980 series was used for volume production of magnetic recording heads.[3]
The Tegal 980 ACS system was used for photoresist treatment prior to critical electroplating processes.[2]
The Tegal 980 ACS system supported silicon nitride and oxide dielectric etch, polymer etch treatments, and other high-throughput plasma processes.[2]
- Non-critical plasma etch processes for 200mm wafers
- High-volume fabrication of storage devices
- Photoresist treatment prior to critical electroplating processes
- Silicon nitride dielectric etch
- Oxide dielectric etch
- Polymer etch treatments
- Volume production of magnetic recording heads
What do the numbers mean?
Wafer handling3
Performance1
Control & software1
Configuration & options7
Vintage & configurations
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What kind of process is used in this equipment class?General reference — not yet source-verified
Machines of this class use a controlled chemical or plasma-based removal process, sometimes combined with directional ion action, to clear exposed material.
Why is masking important for this class of machine?General reference — not yet source-verified
Masking protects areas that should remain while the exposed areas are removed by the etch process.
Not publicly documented
The following facts about the 980 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 980 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the 980 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 980 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 980 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 980 are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]web.archive.org — web.archive.orgweb.archive.org
- [2]Press Release — web.archive.orgweb.archive.org
- [3]Tegal - Thin Film Manufacturing Equipment, Etch, Ferroelectrics Etch, Platinum Etch, Oxide Etch, Nitride Etch, Dry Etch, Plasma Etch — web.archive.orgweb.archive.org
Last updated Oct 5, 2026.
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