GCA
The GCA 6100 C Wafer is a lithography stepper for 100 mm wafers. The GCA 6100 C Wafer includes 150 mm X/Y stage travel. The GCA 6100 C Wafer uses a 10X g-line (436) lens with NA=0.28.[1][2]

The GCA 6100 C Wafer includes manual reticle alignment, a wafer alignment microscope with camera, HP laser and HP laser compensator probes, and equipment overlay reticles.[1][2]
The GCA 6100 C Wafer includes a climate control HEPA chamber, a pneumatic flotation base, and a control stack with an RZE PC upgrade controller, alignment monitor, PC monitor, power controls, stage control chassis, AWH chassis, and Maximus 1000 lamp controller.[1][2]
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The following facts about the 6100 C Wafer are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 6100 C Wafer are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 6100 C Wafer are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 6100 C Wafer are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 6100 C Wafer are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 6100 C Wafer is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 5, 2026.
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