Ultratech
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Plate cleaners generally immerse or spray the substrate with one or more cleaning chemistries, followed by rinse cycles and a final drying step. Some configurations incorporate ultrasonic or megasonic agitation to enhance particle removal. The handling system may use a robotic arm or a manual transfer mechanism.
In the semiconductor fabrication workflow, wet cleaning tools are used at multiple stages: before and after photolithography, after etch or deposition steps, and as final clean prior to metrology or packaging. The 603 Plate, being a plate cleaner, is suited for cleaning flat substrates such as photomasks, reticles, or carrier plates.
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The following facts about the 603 Plate are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 603 Plate are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 603 Plate are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 603 Plate are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 603 Plate are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 603 Plate is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 6, 2026.
The Glen/YES 1000FP is a plasma cleaning system designed to accept a range of shelf sizes for changing flat panel industry needs.
The 1000P is a plasma cleaning system with four 16 x 16 inch shelves and a total capacity of 1024 square inches.
The Semitool 11600 SRD is a spin rinse dryer manufactured by Semitool.