Tokyo Electron
Clean Track Mark 8
The Tokyo Electron Clean Track Mark 8 is a coater and developer system for 8-inch wafers. The Clean Track Mark 8 was used for resist coating and development in EUV lithography research. The Clean Track Mark 8 was also utilized in 193 nm lithography resist processing.[1][2][3][4]
What it is
The Clean Track Mark 8 was manufactured by Tokyo Electron Limited. The system accommodates 200 millimeter diameter wafers. The tool functions as both a coater and a developer. The Clean Track Mark 8 is configured with two coater cups including one anti-reflective coating cup and two developer cups with a four-cup frame, along with one wafer edge etch module. The coater section has two resist pumps of type RRC and the developer section uses two H nozzles.[1][2][3][4]
How it works
General reference — not yet source-verifiedIn operation, the Clean Track Mark 8 spins a wafer at high speed while dispensing liquid photoresist onto its surface to create a uniform thin film. The coated wafer then undergoes a soft bake on a hot plate to evaporate solvents. After exposure, the wafer returns to the track for development, where developer solution is dispensed onto the wafer while spinning, followed by a rinse and spin-dry. The system may include multiple cups and nozzles to support different resist and developer chemistries.
What do the numbers mean?
Vacuum & pumping3
Wafer handling2
Gas & chemistry4
Configuration & options5
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Clean Track Mark 8 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Clean Track Mark 8 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Clean Track Mark 8 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Clean Track Mark 8 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Clean Track Mark 8 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Clean Track Mark 8 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (6)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]jstage.jst.go.jp — jstage.jst.go.jpjstage.jst.go.jp
- [3]https://www.jstage.jst.go.jp/article/photopolymer1988/15/3/15_3_361/_pdf — jstage.jst.go.jpjstage.jst.go.jp
- [4]https://www.jstage.jst.go.jp/article/photopolymer1988/14/3/14_3_407/_pdf — jstage.jst.go.jpjstage.jst.go.jp
- [5]Inventory photo
- [6]Inventory photo
Last updated Oct 7, 2026.
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