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MKS

Vision 2000-E™

MKS Vision 2000-E™ family
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The Vision 2000-E™ is a residual gas analyzer for multi-pressure, CVD and ALD processes. The Vision 2000-E™ has a minimum detectable partial pressure of less than 2e-11 Torr. The Vision 2000-E™ provides continuous in situ monitoring and baseline monitoring for air leaks and background contamination.[1]

MKSVision 2000-E™
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Vacuum

Multi-pressure, CVD & ALD processes[1]

Gas delivery

Residual Gas Analyzer (Mass Spectrometer)[1]

What it is

The MKS Vision 2000-E is a residual gas analyzer designed for multi-pressure, chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. The instrument has a minimum detectable partial pressure of less than 2e-11 Torr (less than 2.7e-9 Pa). The Vision 2000-E features continuous in situ monitoring, baseline monitoring for air leaks and background contamination, and a Remote Vacuum Controller (RVC) for failsafe vacuum operation.[1]

Applications

The Vision 2000-E is specifically applied to baseline monitoring for air leaks and background contamination, enabling fast identification of vacuum integrity issues during process recovery and maintenance.[1]

What do the numbers mean?

Vacuum & pumping3

Application
Multi-pressure, CVD & ALD processes[1]
Accurate?
Minimum detectable partial pressure
< 2e-11 Torr[1]
Accurate?
Vacuum safety
Remote Vacuum Controller (RVC) for failsafe vacuum operation[1]
Accurate?

Gas & chemistry1

Product type
Residual Gas Analyzer (Mass Spectrometer)[1]
Accurate?

Configuration & options2

Monitoring capability
Continuous in situ monitoring[1]
Accurate?
Leak and contamination monitoring
Baseline monitoring for air leaks and background contamination[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Product typeResidual Gas Analyzer (Mass Spectrometer)[1]
  • ApplicationMulti-pressure, CVD & ALD processes[1]
  • Minimum detectable partial pressure< 2e-11 Torr[1]
  • Vacuum safetyRemote Vacuum Controller (RVC) for failsafe vacuum operation[1]

Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What is the minimum detectable partial pressure of the MKS Vision 2000-E?

The minimum detectable partial pressure is less than 2e-11 Torr (less than 2.7e-9 Pa).[1]

What processes is the Vision 2000-E designed for?

The Vision 2000-E is designed for multi-pressure, chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes.[1]

Does the Vision 2000-E provide continuous monitoring?

Yes, the instrument provides continuous in situ monitoring of the vacuum environment.[1]

What safety feature does the Vision 2000-E include?

The instrument includes a Remote Vacuum Controller (RVC) for failsafe vacuum operation.[1]

What does the baseline monitoring function detect?

The baseline monitoring function detects air leaks and background contamination.[1]

Not publicly documented

The following facts about the Vision 2000-E™ are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Vision 2000-E™ are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Vision 2000-E™ are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Vision 2000-E™ are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Vision 2000-E™ are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Vision 2000-E™ is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]api.p1.mks.com — api.p1.mks.comapi.p1.mks.com
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Last updated Sep 22, 2026.

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