Comparison ledger
Applied Materials 0010-03485 Magnet Assy, MKS Vision 2000-E™, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | |
|---|---|---|
| OEM | Applied Materials | MKS |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | MKS Vision 2000-E™ |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Product type | — | Residual Gas Analyzer (Mass Spectrometer)[5] |
| Application | — | Multi-pressure, CVD & ALD processes[5] |
| Minimum detectable partial pressure | — | < 2e-11 Torr[5] |
| Monitoring capability | — | Continuous in situ monitoring[5] |
| Leak and contamination monitoring | — | Baseline monitoring for air leaks and background contamination[5] |
| Vacuum safety | — | Remote Vacuum Controller (RVC) for failsafe vacuum operation[5] |