Waferpedia

Laurell

EDC-HL-8 B

Laurell EDC-HL-8 B is an EDC System spin coater in the 650-series. Laurell EDC-HL-8 B has a maximum substrate size of 200mm (7" x 7"). Laurell EDC-HL-8 B has a maximum speed of 12000 rpm.[1]

LaurellEDC-HL-8 B
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What it is

The Laurell EDC-HL-8 B is an EDC System spin coater in the 650-series. The Laurell EDC-HL-8 B has a maximum substrate size of 200 mm.[1]

How it works

The Laurell EDC-HL-8 B is rated for a maximum speed of 12000 rpm. The Laurell EDC-HL-8 B supports tabletop, in-deck, and on-deck mounting options.[1]

Where it fits in the process flow

General reference — not yet source-verified

A spin coater typically sits near the front end of a resist-processing flow. The machine applies a uniform liquid layer before downstream exposure, drying, or other lithographic steps.

Applications

General reference — not yet source-verified

Spin coaters are used for photoresist application and for other thin-film coatings on flat substrates. Spin coating is also used for uniform polymer, sol-gel, and similar liquid films in laboratory and production environments.

What do the numbers mean?

Wafer handling1

Max. Substrate Size
200mm (7" x 7")[1]
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Configuration & options6

Model
EDC-HL-8 B[1]
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OEM
Laurell[1]
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Type
EDC System[1]
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Series
650-series[1]
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Max. RPM
12000 rpm[1]
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Mounting Options
Tabletop, In-Deck, On-deck[1]
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Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What is the maximum substrate size for the Laurell EDC-HL-8 B?

The Laurell EDC-HL-8 B has a maximum substrate size of 200 mm.[1]

What mounting options are supported by the Laurell EDC-HL-8 B?

The Laurell EDC-HL-8 B supports tabletop, in-deck, and on-deck mounting options.[1]

What model family includes the Laurell EDC-HL-8 B?

The Laurell EDC-HL-8 B is part of the 650-series.[1]

Not publicly documented

The following facts about the EDC-HL-8 B are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EDC-HL-8 B are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the EDC-HL-8 B are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the EDC-HL-8 B are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the EDC-HL-8 B are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the EDC-HL-8 B is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]images.laurell.com — images.laurell.comimages.laurell.com
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Last updated Oct 7, 2026.

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