Laurell
EDC-650-23B
What it is
How it works
General reference — not yet source-verifiedA spin coater applies liquid to a rotating substrate so centrifugal force spreads the liquid into a thin film.
A resist processing spin coater is used to dispense and spread photoresist or related coatings on a workpiece before later exposure or bake steps.
Where it fits in the process flow
General reference — not yet source-verifiedThe Laurell EDC-650-23B sits in the resist coating portion of a lithography process flow.
A resist coating machine is generally used before soft bake, alignment, and exposure steps.
Applications
General reference — not yet source-verifiedSpin coaters are used for resist coating and other thin-film deposition tasks on flat substrates.
Equipment of this class is used in semiconductor, biotechnology, and nanotechnology workflows.
What do the numbers mean?
Wafer handling1
Control & software1
Configuration & options4
Vintage & configurations
What replaced it?
Related models
- siblingLaurell WS-650-23B— Same substrate size and RPM but different type (Spin Coater vs EDC System) within the 650 Seriessource[1]
- siblingLaurell WS-650-8B— 650 Series spin coater with Ø200mm substrate capacitysource[1]
- siblingLaurell WS-650-15B— 650 Series spin coater with Ø300mm substrate capacitysource[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the EDC-650-23B are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the EDC-650-23B are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the EDC-650-23B are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the EDC-650-23B are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the EDC-650-23B is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the EDC-650-23B are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]laurell.com — laurell.comlaurell.com
Last updated Oct 7, 2026.
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The Laurell 750 Series is a spin coater line for spin coating applications.
The Laurell EDC-650-23 B is an EDC System 650-series spin coater with a maximum substrate size of ø 150mm (5" × 5") and a maximum speed of 12000 rpm.
The Laurell EDC-HL-23 B is an EDC System 650-series spin coater with a maximum substrate size of 150 mm (5" x 5") and a maximum speed of 12000 rpm.
The Laurell H6-23 B is a Spin Coater in the 650-series. The Laurell H6-23 B accepts a maximum substrate size of ø 150mm (5" × 5") and is rated to 12000 rpm.