Karl Suss
MA8
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
Plate 01SUSS MA8 Gen-3 Aligner
Hommer Technology Co.,LtdWatch on YouTubePlate 02SUSS MA8 Gen2
Hommer Technology Co.,LtdWatch on YouTubePlate 03Karl Suss MA8/BA6 Mask Aligner (ID# 3568)
ClassOneEngineeringWatch on YouTubePlate 04SUSS MICROTEC MA8 / BA8 MASK ALIGNER (Gen 3) (ID# 4921)
ClassOneEngineeringWatch on YouTubePlate 05SUSS MICROTEC MA8 / BA8 MASK ALIGNER (Gen 3) (ID# 4921)
ClassOneEngineeringWatch on YouTube
What it is
General reference — not yet source-verifiedMachines of this class are lithography tools that place a patterned image onto a light-sensitive coating on a substrate. The pattern is then developed into a resist image that serves as a template for subsequent material processing steps.
How it works
General reference — not yet source-verifiedA lithography tool of this class typically brings a patterned mask or reticle into an optical or contact-based relationship with the coated substrate, aligns the image to existing features, and exposes the resist with controlled illumination. The exposed resist is then chemically developed so that selected areas are removed or retained according to the resist tone and process flow.
The essential functions of the class are alignment, exposure, and image transfer. The machine controls the relative position of mask and substrate, the delivery of light, and the repeatability of the exposure so that the printed pattern matches the intended layout.
What can it run?
Process applications and technology nodes documented for this tool.
- Photolithography
- Lithography
- Contact alignment
What do the numbers mean?
Optics & imaging1
Configuration & options3
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of equipment is the Karl Suss MA8?
The Karl Suss MA8 is a mask aligner used for photolithography.[1]
Which exposure wavelengths are available on the Karl Suss MA8?
The tool supports i-line and g-line exposure wavelengths.[2]
Not publicly documented
The following facts about the MA8 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA8 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA8 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA8 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA8 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MA8 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]nanolab.berkeley.edu — nanolab.berkeley.edunanolab.berkeley.edu
- [2]Lithography — nanolab.berkeley.edunanolab.berkeley.edu
- [3]Capabilities — nanolab.berkeley.edunanolab.berkeley.edu
Last updated Oct 3, 2026.
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