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Denton Vacuum

Discovery

DepositionDenton Vacuum Discovery family
Research Quality: 70% complete

The Denton Discovery is a family of magnetron sputter deposition systems. The Discovery platform can accommodate substrates up to 300 mm. The Discovery platform supports DC, RF, and pulsed DC sputtering.[1][2][3]

Discovery — Inventory photo
Fig. 01DiscoveryInventory photo[4]
  • Plate 01Denton Vacuum System: The Discovery Sputter Module for High-Volume III-V Semiconductor Manufacturing

    Denton VacuumWatch on YouTube
  • Plate 02Denton Vacuum: The Accidental Ion Source: A Discovery from a Failed Experiment

    Denton VacuumWatch on YouTube
  • Plate 03Denton Vacuum System: Changing a Cathode in a Discovery Sputtering System

    Denton VacuumWatch on YouTube

Power

RF Turners (2)[4]

Vacuum

Denton Vacuum[4]

Performance

< +/-5%[2]

What it is

The Denton Vacuum Discovery is a series of magnetron sputtering deposition systems used for physical vapor deposition (PVD) of thin films. Magnetron sputtering is a plasma-based technique that creates dense films with good adhesion, suitable for metals and insulating materials with demanding optical or electrical properties.[7][1]

The Discovery platform is highly configurable and can be tailored for different sputtering geometries, including confocal, planar (Discovery V), and inverted cylindrical (Discovery I) configurations. Variants include the Discovery 200 (for substrates up to 200 mm), Discovery 300 (for substrates up to 300 mm), Discovery V, Discovery I, and larger formats such as Discovery 635 and Discovery 785.[2][8][5]

How it works

In magnetron sputtering, a magnetically confined plasma is created near the surface of a target material. Positively charged energetic ions from the plasma collide with the negatively charged target, ejecting atoms that then deposit onto a substrate. The closed magnetic field traps electrons, increasing ionization efficiency and allowing the plasma to be sustained at lower pressures, which reduces background gas incorporation and energy losses in the sputtered atoms.[7][1]

The Discovery system can be configured with multiple cathodes in different geometries. In a confocal configuration, up to four cathodes are positioned around the substrate, enabling co-sputtering of multiple materials without breaking vacuum. The planar cathode (Discovery V) mounts directly above the substrate for high deposition rate and uniformity. The inverted cylindrical cathode (Discovery I) coats substrates on all sides, providing excellent thickness control on curved surfaces. Each cathode can be optimized for a specific deposition method, and the system supports DC, RF, and pulsed DC power supplies.[1][3][2]

Applications

The Discovery magnetron sputtering platform is used for depositing thin films in a variety of industries. Typical applications include semiconductor device manufacturing, optical coatings for filters and lenses, metal and dielectric coatings for electronics, thin-film batteries, and protective or functional coatings such as diamond-like carbon and transparent conductive oxides.[2][1]

Additional applications include high-volume production of advanced optical filters, biocompatible coatings for medical implants, thin film resistors and sensors, large area hybrid circuit fabrication, and metal contacts for compound semiconductors. The system also supports research and development activities.[3][5]

What do the numbers mean?

Power & electrical6

Angstorm Sciences RF Cathodes with Power Supplies / Controllers (2)[4]
Accurate?
RF Turners (2)[4]
Accurate?
Advanced Energy Dressler Cesar RF Power Generator (2)[4]
Accurate?
Stand Alone Power Supply / Control[4]
Accurate?
Power Supply
DC, RF, Pulsed DC[2]
Accurate?
Substrate Bias
RF bias with dedicated power supply and auto matching network[2]
Accurate?

Vacuum & pumping7

Denton Vacuum[4]
Accurate?
CTI Cryogenics Cryo Torr 8 Cryogenic Pump with Monitor[4]
Accurate?
KYKY Turbo Pump with MDL 1200 H Controller[4]
Accurate?
Related Pressure Monitors[4]
Accurate?
B&W MDL TRP 90 Vacuum Pump[4]
Accurate?
CTI Cryogenics 8200 Compressor[4]
Accurate?
Vacuum
Cryo/Turbo[2]
Accurate?

Wafer handling2

Substrate Size (Discovery 200)
Up to 200 mm[2]
Accurate?
Substrate Size (Discovery 300)
Up to 300 mm[2]
Accurate?

Performance3

Coating Uniformity (Discovery 200/300)
< +/-5%[2]
Accurate?
Coating Uniformity (Discovery V)
< +/-2%[2]
Accurate?
Coating Uniformity (Discovery I)
< +/-0.25%[2]
Accurate?

Control & software2

Computer Control System[4]
Accurate?
Software[4]
Accurate?

Configuration & options9

With Lipon Deposition[4]
Accurate?
2' x 2' x 3' High Steel Chamber[4]
Accurate?
Isolation Valves[4]
Accurate?
Related Hardware[4]
Accurate?
Vat Gate Valves (2)[4]
Accurate?
Technology
Magnetron sputtering[1]
Accurate?
Cathode Configuration (Discovery 200)
Up to four 4" diameter confocal sources[2]
Accurate?
Cathode Configuration (Discovery 300)
Up to three 6" diameter confocal sources[2]
Accurate?
Plasma Emission Monitor
Yes (Discovery 200/300), No (Discovery V), Yes (Discovery I)[2]
Accurate?

Vintage & configurations

Documented models & variants

DesignationGenerationVintageChangesSource
Discovery 200——Up to 200 mm substrates; up to four 4" confocal cathodes; tri-axis adjustment; coating uniformity < +/-5%info.dentonvacuum.com[2]
Discovery 300——Up to 300 mm substrates; up to three 6" confocal cathodes; tri-axis adjustment; coating uniformity < +/-5%info.dentonvacuum.com[2]
Discovery V——Planar magnetron; up to 200 mm substrates; coating uniformity < +/-2%info.dentonvacuum.com[2]
Discovery I——Inverted cylindrical magnetron; up to 200 mm substrates; coating uniformity < +/-0.25%info.dentonvacuum.com[2]
Discovery 635——Maximum substrate up to 8" diameter; options include RF etch/bias, water cooled table, reactive flow control, substrate flip, in-situ ellipsometryinfo.dentonvacuum.com[5]
Discovery 785——Maximum substrate up to 30" diameter; options include RF etch/bias, water cooled table, reactive flow control, substrate flip, in-situ ellipsometryinfo.dentonvacuum.com[5]
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What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • ConfigurationDenton Vacuum[4]
  • ConfigurationAngstorm Sciences RF Cathodes with Power Supplies / Controllers (2)[4]
  • ConfigurationRF Turners (2)[4]
  • ConfigurationCTI Cryogenics Cryo Torr 8 Cryogenic Pump with Monitor[4]
  • ConfigurationKYKY Turbo Pump with MDL 1200 H Controller[4]
  • ConfigurationAdvanced Energy Dressler Cesar RF Power Generator (2)[4]
  • ConfigurationRelated Pressure Monitors[4]
  • ConfigurationB&W MDL TRP 90 Vacuum Pump[4]
  • ConfigurationStand Alone Power Supply / Control[4]
  • ConfigurationCTI Cryogenics 8200 Compressor[4]
  • Power SupplyDC, RF, Pulsed DC[2]
  • VacuumCryo/Turbo[2]
  • Substrate BiasRF bias with dedicated power supply and auto matching network[2]

Where are the manuals?

Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

How many cathodes can be configured in a confocal arrangement?

The Discovery Confocal system can accommodate up to four cathodes in a confocal arrangement, each with triaxis adjustment of offset, target-to-substrate distance, and angle.[3]

What power supply types are available for sputtering?

The Discovery platform supports DC, RF, and pulsed DC power supplies depending on the target material and configuration. For the inverted cylindrical cathode (Discovery I), DC and mid-frequency AC are used.[2][1]

What coating uniformity can be achieved?

The Discovery 200 and 300 provide coating uniformity better than ±5%. The Discovery V achieves better than ±2%, and the Discovery I achieves better than ±0.25%.[2]

Not publicly documented

The following facts about the Discovery are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Discovery are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • The control-system platform and OS era of the Discovery are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Discovery are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Discovery is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

  • No publicly documented compatible parts, consumables, or accessories for the Discovery are on record.

    Answerable by: an OEM parts catalog or a service engineer

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Sources & citations

Sources (10)Every fact above is drawn from these public sources
  1. [1]dentonvacuum.com — dentonvacuum.comdentonvacuum.com
  2. [2]info.dentonvacuum.com — info.dentonvacuum.cominfo.dentonvacuum.com
  3. [3]Discovery Confocal Magnetron Sputtering System - Denton Vacuum — dentonvacuum.comdentonvacuum.com
  4. [4]Inventory photo
  5. [5]info.dentonvacuum.com — info.dentonvacuum.cominfo.dentonvacuum.com
  6. [6]fabsurplus.comfabsurplus.com
  7. [7]How magnetron sputtering works in thin film deposition — dentonvacuum.com (Jan 14, 2025)web.archive.org
  8. [8]https://info.dentonvacuum.com/hubfs/DEN_223%20-%20Discovery%20Brochure_3_15_23.pdf — info.dentonvacuum.cominfo.dentonvacuum.com
  9. [9]Denton Discovery 18 | Utah Nanofab — nanofab.utah.edunanofab.utah.edu
  10. [10]Denton Discovery Sputterer | UCLA Nanolab — nanolab.ucla.edunanolab.ucla.edu
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Last updated Oct 3, 2026.

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