Comparison ledger
Applied Materials 0010-13622 RF Match for, Denton Vacuum Discovery, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | DiscoveryDenton Vacuum |
|---|---|---|
| OEM | Applied Materials | Denton Vacuum |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Denton Vacuum Discovery |
| Cited variants | — | |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[3] | With Lipon Deposition[4] |
| Model | 0010-13622[3] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[3] | — |
| Feature | High Efficiency HE RF Match-Bias[3] | — |
| Technology | — | Magnetron sputtering[5] |
| Substrate Size (Discovery 200) | — | Up to 200 mm[1] |
| Substrate Size (Discovery 300) | — | Up to 300 mm[1] |
| Cathode Configuration (Discovery 200) | — | Up to four 4" diameter confocal sources[1] |
| Cathode Configuration (Discovery 300) | — | Up to three 6" diameter confocal sources[1] |
| Power Supply | — | DC, RF, Pulsed DC[1] |
| Vacuum | — | Cryo/Turbo[1] |
| Substrate Bias | — | RF bias with dedicated power supply and auto matching network[1] |
| Plasma Emission Monitor | — | Yes (Discovery 200/300), No (Discovery V), Yes (Discovery I)[1] |
| Coating Uniformity (Discovery 200/300) | — | < +/-5%[1] |
| Coating Uniformity (Discovery V) | — | < +/-2%[1] |
| Coating Uniformity (Discovery I) | — | < +/-0.25%[1] |
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