ASML
PAS 2400
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
The PAS 2400 was developed by ASML as an improvement over the earlier PAS 2000 design. The machine was not as accurate as ASML had hoped, but it could expose 90 wafers per hour. The PAS 2400 served as a demonstrator in 1985 and won a first contract with AMD that promised delivery of 25 machines by 1987.[1]
How it works
Where it fits in the process flow
General reference — not yet source-verifiedIn a semiconductor fabrication flow, the lithography step follows wafer cleaning and surface preparation. After exposure and development of the photoresist, the wafer moves to etching or ion implantation steps. The stepper is a key tool for defining the critical dimensions of each layer in an integrated circuit.
Why won't it start?
Documented failure modes, common issues, and field considerations.
- The PAS 2400 was not as accurate as ASML had hoped.
What do the numbers mean?
Wafer handling2
Performance1
Vintage & configurations
- 1985Demonstration and first contract[1]
The PAS 2400 was used as a demonstrator to win a contract with AMD promising delivery of 25 machines by 1987.
What replaced it?
Related models
- predecessorASML PAS 2000— The PAS 2400 was an improvement over the PAS 2000, which had used oil pressure and was a commercial and technical failure.source[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What was the ASML PAS 2400?
The PAS 2400 was a wafer stepper, a photolithography machine developed by ASML as an improved design following the PAS 2000.[1]
What was the throughput of the PAS 2400?
The PAS 2400 could expose 90 wafers per hour.[1]
In which year was the PAS 2400 used as a demonstrator?
The PAS 2400 was used as a demonstrator in 1985.[1]
What contract did the PAS 2400 help ASML secure?
The PAS 2400 helped ASML win a first contract with AMD that promised delivery of 25 machines by 1987.[1]
Was the PAS 2400 considered accurate?
The PAS 2400 was not as accurate as ASML had hoped.[1]
Not publicly documented
The following facts about the PAS 2400 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the PAS 2400 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the PAS 2400 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the PAS 2400 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the PAS 2400 are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the PAS 2400 are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]en.wikipedia.org — en.wikipedia.orgen.wikipedia.org
Last updated Sep 23, 2026.
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