Applied Materials
The Applied Materials Centura is a modular multichamber cluster platform used in semiconductor manufacturing.
The Centura platform uses a central wafer-handling robot to transfer wafers among multiple process chambers and load locks. Etching is performed by exposing the wafer to a chemically reactive plasma in a dedicated process chamber.
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
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The system has six chamber positions: Chamber A is an XE+ non-toxic atmospheric etch chamber, Chambers B, C, and D are empty, and Chambers E and F are single-slot fast cooldown stations.[1]
The system uses an Asyst LPT2200 SMIF robot.[1]
The system uses a Vita Computer Controller (Modular Controller).[1]
The gas delivery system includes a ten-RA gas panel with top feed gas line input, multiple line drop gas distribution, individual gas line lockout tagout, and an STEC Z500 MFC type first manifold.[1]
The following facts about the Centura TPCC RTP XE+ are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Centura TPCC RTP XE+ are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Centura TPCC RTP XE+ are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Centura TPCC RTP XE+ are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Centura TPCC RTP XE+ are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Centura TPCC RTP XE+ is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Sep 22, 2026.
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