Agilent
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The Agilent E 500 is an 8-inch medium current ion implanter. The Agilent E 500 is categorized under ion implantation equipment.[1][2]
Ion implanters accelerate dopant ions into a wafer surface to introduce controlled impurity concentrations.
A medium current implanter is used for implantation steps that require a balance between beam current and dose control.
Ion implantation follows pattern definition steps and precedes thermal processing used to activate and redistribute dopants.
The Agilent E 500 fits into doping and junction formation steps in the front end of semiconductor device fabrication.
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| E 500 EHPI | — | 2003 | Medium current ion implanter for 8-inch wafers. | waferpedia.com[2] |
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The following facts about the E 500 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the E 500 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the E 500 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the E 500 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the E 500 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the E 500 are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Oct 4, 2026.
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.
The Varian 160 XP Ion is an ion implantation tool configured as a 150mm high-current implanter.