Heidelberg Instruments VPG200

Models in this family

1. 

   VPG200

   Heidelberg Instruments VPG200 is a laser pattern generator used for mask production, direct exposure on SEMI-standard wafers, and mask reticles.

   Cited variants

   Designation	Generation	Vintage	Changes	Source
   VPG200 with 4 mm Write Head	—	—	Critical dimension 0.6 µm, pattern edge roughness max 90 nm, alignment accuracy < 300 nm	epfl.ch[1]
   VPG200 with 10 mm Write Head	—	—	Critical dimension 0.9 µm, pattern edge roughness max 140 nm, alignment accuracy < 400 nm	epfl.ch[1]
   VPG200 with 20 mm Write Head	—	—	Critical dimension 2.0 µm, pattern edge roughness max 250 nm, alignment accuracy < 800 nm	epfl.ch[1]

Sources