Comparison ledger
Headway 1 EC 101 R 485 Photoresist Spinner, Hitachi HS 9050, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | HS 9050Hitachi | |
|---|---|---|
| OEM | Headway | Hitachi |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | Mini-Environment Wafer Loading Module (EFEM) |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Headway 1 EC 101 R 485 Photoresist Spinner | Hitachi HS 9050 |
| Specifications | ||
| Vacuum requirement | 23" Hg[1] | — |
| Electrical | 115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[1] | — |
| Configuration | — | Multi-chamber[2] |
| Wafer size | — | Mini-Environment Wafer Loading Module (EFEM)[2] |
| Centering Unit | — | V-notch alignment and centering[2] |
| Make | — | Hitachi[2] |
| Model | — | HS 9050[2] |
| Tool type | — | Asher[2] |
| Wafer loading module | — | Copper Mini-Environment Wafer Loading Module (EFEM)[2] |
| Load ports | — | 3 ea 25-wafer FOUP-capable load ports with N2 purge[2] |
| Robot | — | Four Axis Robot[2] |
| Chamber count | — | 7 chamber tool[2] |
| Ashing units | — | Five (5) Ashing Units[2] |
| Source unit | — | Lambda Source Unit[2] |
| Capacitance manometer | — | 722B11TCD2FA[2] |
| RF power supply | — | AXG-5000Ⅲ-27M-KE[2] |
| EPD | — | Multi-wavelength EPD, 0.1s sampling (Spectrometer)[2] |
| MFC #N | — | N2 Max Flow 20 L/min[2] |
| MFC #1 | — | O2 Max Flow 20 L/min[2] |
| MFC #2 | — | Ar Max Flow 20 L/min[2] |
| MFC #3 | — | H2 Max Flow 5 L/min[2] |
| MFC #4 | — | N2 Max Flow 20 L/min[2] |
| MFC #5 | — | CF4 Max Flow 1 L/min[2] |
| MFC #6 | — | CO2 Max Flow 0.4 L/min[2] |
| MFC #7 | — | He Max Flow 20 L/min[2] |
| MFC #8 | — | Without gasline, without MFC[2] |
| MFC #9 | — | Without gasline, without MFC[2] |
| MFC #10 | — | Without gasline, without MFC[2] |
| Cooling units | — | Two (2) Cooling Units[2] |
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