Applied Materials
P 5000 Mark II DLH alternatives
Comparable Deposition equipment documented in the Waferpedia catalog.
6 comparable tools
Lam Research
Concept One 150
Deposition
The Lam / Novellus Concept One 150 is a plasma-enhanced chemical vapor deposition (PECVD) system for 6-inch wafers.
Lam Research
Concept One 200 PECVD-TEOS
Deposition
The Lam / Novellus Concept One 200 PECVD-TEOS is a plasma-enhanced chemical vapor deposition tool for tetraethyl orthosilicate processing.
Lam Research
Gasonics Vector Express
Deposition
The Lam / Novellus / Gasonics Vector Express is a PECVD system stated to be configured for 12-inch wafers.
Lam Research
Gasonics Vector SOLA
Deposition
The Lam / Novellus / Gasonics Vector SOLA is a plasma-enhanced chemical vapor deposition (PECVD) system that processes 12-inch wafers and includes a UV cure capability.
Oxford Instruments
Plasmalab 800 Plus
Deposition
The Oxford Plasmalab 800 Plus is a PECVD (plasma-enhanced chemical vapor deposition) system.
Orient Service
S 1861 14
Deposition
Orient Service S 1861 14 is a PECVD (plasma-enhanced chemical vapor deposition) system used with SiO2, HCL, HF, NOx, and NH3.
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