Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusNanospec 9300 Film Analysis

Applied Materials 0010-03485 Magnet Assy, Onto Innovation Nanospec 9300 Film Analysis, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsOnto Innovation
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyOnto Innovation Nanospec 9300 Film Analysis
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]Nanospec 9300[5]
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]Onto Innovation / Nanometrics[5]
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Tool type—Film Analysis System[6]
Measurement application—Thin film thickness measurement[7]
Instrument type—Spectroscopic Reflectometer (SR)[7]
Configured wafer size—12"[7]
Alternate wafer handling—Can be modified for 8" open cassette handling[7]
Visible light source—Tungsten halogen lamp[7]
UV light source—Deuterium arc lamp[7]
Lens—4x, 15x (Visible & UV)[7]
System computer and monitor—Computer & LCD monitor[7]
Metrology software—Windows XP-based N2000 metrology software (Version N2000 4.2.90 Beta)[7]
Head type—UV DIO[7]
Video camera—RS170 (B/W)[7]
Wafer handling—Kensington Robot & Stage Asyst FOUP 300mm[7]
Input power—208 VAC, 18 A, 50/60 Hz[7]
Optics—4x, 15x (Visible & UV)[5]
Vintage year—2002[7]
Sources (7)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]waferpedia.comwaferpedia.com
  6. [6]Equipment inventory listing
  7. [7]wotol.comwotol.com