Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Branson IPC 2000 / 3000, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | IPC 2000 / 3000Branson |
|---|---|---|
| OEM | Applied Materials | Branson |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Branson IPC 2000 / 3000 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | Refurbished[5] |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | IPC 2000 / 3000[5] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | Branson[5] |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Equipment family | — | Branson/IPC 2000, 3000, and 4000 Series manual plasma systems[6] |
| Loading | — | Manual load / unload[6] |
| Process type | — | Plasma ashing, descum, dry cleaning, surface treatment, or plasma etching depending on configuration[6] |
| Wafer / sample size | — | Small samples up to 8 inch wafers depending on model and chamber configuration[6] |
| Chamber type | — | Quartz chamber for ashing / descum or metal chamber for etching depending on model[6] |
| RF power | — | Configuration dependent[6] |
| Gas lines | — | Configuration dependent[6] |
| Wafer quantity per run | — | Configuration dependent[6] |
| Operation | — | Automatic, semi-automatic, or manual depending on controller configuration[6] |
| PC controller upgrade option | — | Available for selected working systems, subject to evaluation[6] |
| Model family | — | IPC 2000 / 3000 family[7] |