Varian
E 500 HP Ion
The Varian E 500 HP Ion is an ion implantation tool. The Varian E 500 HP Ion accepts 6-inch wafers. The Varian E 500 HP Ion operates on 208 V, 60 Hz, three-phase power.[1]
What it is
General reference — not yet source-verifiedThe Varian E 500 HP Ion is an ion implantation machine.
How it works
General reference — not yet source-verifiedAn ion implanter accelerates charged dopant ions and drives them into a wafer surface to alter electrical properties.
An ion implantation tool typically uses an ion source, beam transport, energy selection, scanning or rastering, and a wafer handling stage to place dopants with controlled dose and depth.
Where it fits in the process flow
General reference — not yet source-verifiedIon implantation is used in semiconductor fabrication after patterning steps have defined where dopants should enter the substrate.
Ion implantation is commonly followed by thermal processing that activates dopants and repairs implantation damage.
Applications
General reference — not yet source-verifiedIon implantation is used to form source and drain regions, wells, threshold adjustment regions, and other localized doping features in semiconductor devices.
Ion implantation is used across mature silicon device fabrication where precise control of dopant placement and concentration is required.
What do the numbers mean?
Power & electrical3
Wafer handling1
Configuration & options7
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the E 500 HP Ion are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the E 500 HP Ion are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the E 500 HP Ion are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the E 500 HP Ion are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the E 500 HP Ion are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the E 500 HP Ion is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]waferpedia.com — waferpedia.comwaferpedia.com
- [2]Inventory photo
- [3]Inventory photo
- [4]Inventory photo
Last updated Oct 6, 2026.
Compare with similar tools
View all →The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.
The Varian 160 XP Ion is an ion implantation tool configured as a 150mm high-current implanter.