Trion
Apollo
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
The Trion Apollo is a photoresist stripping and ashing system used in semiconductor manufacturing for the removal of photoresist layers after lithography and etching steps. The system is designed as a compact production tool that can handle a range of wafer sizes from 100 mm to 300 mm.[1][2]
The Apollo incorporates either an inductively coupled plasma (ICP) source or a microwave source, depending on the application requirements. The system is intended for use in production fabs, pilot lines, and research environments where high-rate, low-damage resist removal is needed.[1][2]
How it works
A production-proven multi-axis atmospheric robot with two- or three-link arms provides wafer handling within the system, supporting wafers from 150 mm to 300 mm. The process controller is a PC-based system with graphical software that creates recipes in block-diagram form, stored on 3.5-inch disks. The overall dimensions of the single-chamber system are 18 inches wide by 50 inches deep by 51 inches high.[3]
Applications
The Trion Apollo is applied to photoresist descum and stripping in semiconductor fabrication, including removal of hardened or difficult-to-remove resist layers at low temperatures using RF bias power. The system can achieve etch rates up to 6 micrometers per minute and is suitable for high-throughput production environments.[1][2]
Applications include MEMS device fabrication, compound semiconductor processing, and pilot-line production. The system supports wafer sizes from 100 mm to 300 mm and can be equipped with either ICP or microwave plasma sources to match different process requirements.[1][2]
What do the numbers mean?
Power & electrical1
Wafer handling4
Gas & chemistry1
Control & software1
Dimensions & facilities1
Configuration & options2
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What wafer sizes does the Apollo support?
The Apollo supports wafers from 100mm to 300mm. The robot transports 150mm, 200mm, and 300mm wafers.[1][2][3]
What plasma sources are available for the Apollo?
The Apollo can incorporate either a microwave source (SST-Lightning) or inductively coupled plasma (ICP) technology.[1][2]
What is the maximum photoresist strip rate?
Does the Apollo include an electrostatic chuck?
Yes, the Apollo has an electrostatic chuck with helium backside cooling.[3]
Not publicly documented
The following facts about the Apollo are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Apollo are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Apollo are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Apollo are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Apollo are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Apollo is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]triontech.com — triontech.comtriontech.com
- [2]triontech.com — triontech.comtriontech.com
- [3]semiconductoronline.com — semiconductoronline.comsemiconductoronline.com
- [4]Equipment inventory listing
Last updated Sep 26, 2026.
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