Tokyo Electron

8 SE

Research Quality: 40% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The Tokyo Electron 8 SE is a thermal processing system from the ALPHA-303i series. The Tokyo Electron 8 SE processes 8-inch wafers at temperatures up to 1250 °C for wet and dry oxidation.^[1]

8 SE — Inventory photo — Fig. 018 SEInventory photo^[2]

How it works

The Tokyo Electron 8 SE employs ART (Adaptive Realtime Temperature) Control, which is based on patented Clairvoyant Control technology. The system also features a thermo plug for enhanced thermal performance.^[1]

What do the numbers mean?

Wafer handling2

Wafer size: 8 inch^[2]
Supported Wafer Size: 8 inch^[2]

Control & software2

Control: Equipped with proven ART (Adaptive Realtime Temperature) Control^[1]
Temperature Control: ART (Adaptive Realtime Temperature) Control^[1]

Dimensions & facilities2

Footprint: Smallest footprint worldwide; 1100 mm wide^[1]
Machine Footprint Width: 1100 mm^[1]

Configuration & options17

High Temperature, Oxide^[2]; Temp Range / Max 1200~1250*C^[2]; Wet Ox, can be used as Dry Ox^[2]
OEM: Tokyo Electron^[2]
Model: 8 SE^[2]
System description: High Temperature, Oxide^[2]
Temperature range / max: 1200~1250*C^[2]
Process: Wet Ox, can be used as Dry Ox^[2]
Product family: TELFORMULA Alpha 303i / ATP Alpha 8-SE / ATP^[1]
Productivity: High productivity powered by thermo plug^[1]
Process Type: High Temperature Oxide, Wet Oxidation, Dry Oxidation^[2]
Maximum Temperature Range: 1200~1250 °C^[2]
Product Series: ALPHA-303i series^[1]
Compliance: JG/SEMI Standards^[1]
Temperature range: 1200~1250°C^[2]
Process type: High temperature oxide processing^[2]
Oxidation type: Wet or dry oxidation^[2]

Interested in this tool?

Need help with this tool?Embed spec card

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

No research found yet — worked with this tool? Share what you know.

Worked with this tool? Help preserve its knowledge →

Frequently asked questions

Can the 8 SE be used for dry oxidation?

Yes, it can be used as a dry oxidation system.^[2]

Not publicly documented

The following facts about the 8 SE are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 8 SE are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 8 SE are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 8 SE are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 8 SE are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 8 SE is not on record.
Answerable by: an OEM datasheet or a fab qualification report