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Tescan

S8000X

Metrology & InspectionTescan S8000X family
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The TESCAN S8000X is a FIB/SEM combining a plasma-source focused ion beam microscope and a high-resolution (BrightBeam) scanning electron microscope. The TESCAN S8000X uses a Xe+ ion plasma source capable of generating a focused beam up to 1 uA. The TESCAN S8000X includes a cryogenic stage and a sample transfer loadlock allowing work down to -160 C.[1]

TescanS8000X
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What it is

The TESCAN S8000X is a versatile instrument for the characterization of materials. It combines a plasma-source focused ion beam microscope and a high-resolution BrightBeam scanning electron microscope.[1]

The instrument is equipped with advanced analytical capabilities, including Time-of-Flight Secondary Ion Mass Spectrometery and an Energy Dispersive x-ray spectrometer. It also includes a cryogenic stage, a sample transfer loadlock, and a cryogenic Kleindiek nanomanipulator.[1]

How it works

The focused ion beam microscope uses a Xe+ ion plasma source. The Xe plasma can generate a focused beam up to 1 uA, which allows very high milling rates and does not lead to deleterious ion implantation in the same way that Ga+ ions do.[1]

The BrightBeam SEM is a field-free, ultra-high resolution electron microscope whose optics allow improved resolution, even at low energies. This improves imaging of non-conducting samples.[1]

Time-of-Flight Secondary Ion Mass Spectrometery detects ions emitted from the sample, allowing chemical characterization. An Energy Dispersive x-ray spectrometer provides additional, complementary chemical characterization.[1]

Where it fits in the process flow

The instrument is used for characterization of materials. Its cryogenic stage and sample transfer loadlock allow work down to -160 C or introduction of frozen samples into the tool to be milled.[1]

A cryogenic Kleindiek nanomanipulator enables users to interact with the sample in-situ as well as lift-out frozen sections for subsequent TEM analysis.[1]

Applications

The BrightBeam SEM improves imaging of non-conducting samples. ToF-SIMS is especially useful in detecting light elements, including the discrimination of hydrogen and deuterium.[1]

The Xe plasma focused beam allows very high milling rates. The instrument is also equipped for additional, complementary chemical characterization with EDS.[1]

  • Materials characterization
  • Chemical characterization
  • Detecting light elements including discrimination of hydrogen and deuterium
  • Work with frozen samples
  • In-situ sample interaction
  • Lift-out of frozen sections for subsequent TEM analysis

What do the numbers mean?

Vacuum & pumping3

Cryogenic capability
Cryogenic stage and sample transfer loadlock allowing work down to -160 C or introduction of frozen samples[1]
Accurate?
Nanomanipulator
Cryogenic Kleindiek nanomanipulator for in-situ interaction and lift-out of frozen sections for subsequent TEM analysis[1]
Accurate?
Cryogenic stage temperature range
down to -160 C[1]
Accurate?

Optics & imaging3

Instrument type
Plasma-source focused ion beam microscope and high-resolution BrightBeam scanning electron microscope[1]
Accurate?
Electron microscope optics
Field-free, ultra-high resolution optics with improved low-energy imaging[1]
Accurate?
Electron source type
BrightBeam SEM, field-free, ultra-high resolution[1]
Accurate?

Configuration & options8

Ion source
Xe+ ion plasma source[1]
Accurate?
Focused beam current
Up to 1 uA[1]
Accurate?
Milling rate
Up to 50X faster than prior Ga+ ion technology[1]
Accurate?
Analytical capability
Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS)[1]
Accurate?
Analytical capability
Energy Dispersive x-ray spectrometer (EDS)[1]
Accurate?
Ion source type
Xe+ ion plasma source[1]
Accurate?
Maximum focused beam current
1 uA[1]
Accurate?
Analytical capabilities
ToF-SIMS and EDS[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Cryogenic capabilityCryogenic stage and sample transfer loadlock allowing work down to -160 C or introduction of frozen samples[1]
  • NanomanipulatorCryogenic Kleindiek nanomanipulator for in-situ interaction and lift-out of frozen sections for subsequent TEM analysis[1]
  • Cryogenic stage temperature rangedown to -160 C[1]

Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What type of ion source does the FIB in the TESCAN S8000X use?

The focused ion beam uses a xenon (Xe⁺) plasma source.[1]

What is the maximum beam current the FIB can deliver?

The Xe plasma source can generate a focused beam up to 1 μA.[1]

How much faster is the milling rate compared to gallium-ion FIBs?

The milling rate can be up to 50 times faster than prior Ga⁺ ion technology.[1]

What analytical instruments are integrated with the S8000X?

The system includes a time-of-flight secondary ion mass spectrometer and an energy-dispersive X-ray spectrometer.[1]

What is the minimum temperature achievable with the cryogenic stage?

The cryogenic stage can cool the sample down to -160 °C.[1]

What is the special feature of the scanning electron microscope in this instrument?

The SEM, called BrightBeam, is a field-free, ultra-high-resolution column that provides improved resolution even at low electron energies.[1]

Not publicly documented

The following facts about the S8000X are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the S8000X are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the S8000X are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the S8000X are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the S8000X are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the S8000X is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]nano.upenn.edu — nano.upenn.edunano.upenn.edu
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Last updated Sep 21, 2026.

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