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Temescal

FC-3800

DepositionTemescal FC-3800 family
Research Quality: 40% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The Temescal FC-3800 is a production evaporation system for thin-film deposition. The Temescal FC-3800 is designed for metallization in the processing of compound semiconductor substrates.[1]

TemescalFC-3800
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What it is

The Temescal FC-3800 is a deposition system in the Temescal product family.[1]

The Temescal FC-3800 belongs to a family of production evaporation systems used for metallization on compound semiconductor substrates.[1]

How it works

An evaporation system of this class is used to apply controlled multi-layer coatings with repeatable uniformity and performance.[1]

Where it fits in the process flow

The Temescal FC-3800 is used in compound semiconductor processing and in production environments that require repeatable coating performance.[1]

Applications

The Temescal FC-3800 is used for metallization on compound semiconductor based substrates.[1]

Temescal deposition systems are used in applications that include compound semiconductor, HB-LED lighting, wireless, ophthalmic lens, triple junction PV solar, precision optic, and telecom subsystems.[1]

  • HB-LED lighting
  • Wireless sub-systems
  • Ophthalmic lens
  • Triple junction PV solar
  • Precision optics
  • Telecommunications sub-systems

What do the numbers mean?

Configuration & options2

Process
Evaporation[1]
Accurate?
Coating materials
Ti, Pt, Au, Pd, Ag, Ni, Al, Cr, Cu, Mo, Sn, SiO2, ITO[1]
Accurate?
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What replaced it?

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What type of process equipment is the Temescal FC-3800?

The Temescal FC-3800 is a deposition system in the Temescal family.[1]

What is the Temescal FC-3800 used for?

The Temescal FC-3800 is used for metallization on compound semiconductor based substrates.[1]

Not publicly documented

The following facts about the FC-3800 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • Fewer than 3 independently cited specifications for the FC-3800 are on record; the remainder await public documentation.

    Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the FC-3800 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the FC-3800 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the FC-3800 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the FC-3800 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

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Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]temescal.ferrotec.com — temescal.ferrotec.comtemescal.ferrotec.com
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Last updated Oct 3, 2026.

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