SUSS MicroTec
Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
General reference — not yet source-verifiedA mask cleaner is used to clean photomasks and related patterning hardware so they can be handled in lithography workflows.
How it works
Photolithography uses ultraviolet light to transfer patterns from a photomask onto a resist-coated substrate, and wet-processing stations support substrate cleaning, resist coating, development, and removal.[6]
Where it fits in the process flow
Wet-processing and cleanroom stations sit alongside photoresist preparation, substrate cleaning, development, and resist removal in microfabrication workflows.[6][7][8]
Applications
Mask cleaning supports photolithography for semiconductor device fabrication and other microfabrication work that uses patterned exposure.[6][7]
Cleanroom lithography workflows that use masks are applied in microelectronics, photonics, integrated optics, and related device fabrication environments.[6][9]
What do the numbers mean?
Optics & imaging1
Configuration & options3
- TXF from OLED[1]
Parts & consumables
Tracked replaceable assemblies, spares criticality, and availability status across all major subsystems. Each entry cites its source.
Where are the manuals?
Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.
- User ManualManualepfl.ch
- Photomask Layout and Generation Guide Rev1.pdfDocumentduke.edu
- Photo-03 - SOP - MJB-3 Mask Aligner.pdfSOPumd.edu
- ManualManualuic.edu
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What nearby process steps are part of the same workflow?
The same workflow includes substrate cleaning, photoresist spin coating, curing, development, and removal.[6]
What does photolithography do in this context?
Photolithography uses ultraviolet light to transfer patterns from photomasks onto substrates coated with photoresist.[6]
Not publicly documented
The following facts about the Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (22)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]Equipment inventory listing
- [4]wiki.nanofab.ucsb.eduwiki.nanofab.ucsb.edu
- [5]wiki.nanofab.ucsb.eduwiki.nanofab.ucsb.edu
- [6]Equipment Capabilities - Electrical & Computer Engineering — ece.utoronto.caece.utoronto.ca
- [7]ECE Teaching Cleanroom | Electrical and Computer Engineering | UC Santa Barbara — ece.ucsb.eduece.ucsb.edu
- [8]Cleanroom Equipment Capabilities and Materials Exclusions | Utah Nanofab — nanofab.utah.edunanofab.utah.edu
- [9]Main cleanroom | Quantum-Nano Fabrication and Characterization Facility | University of Waterloo — uwaterloo.cauwaterloo.ca
- [10]Facilities | Integrated Nanosystems Research Facility — sites.uci.edusites.uci.edu
- [11]Exposure | Stanford Nanofabrication Facility — snfguide.stanford.edusnfguide.stanford.edu
- [12]MNTC - Equipment and Facilities | Service Centers — louisville.edulouisville.edu
- [13]PHOTO-17: MA-4 Suss Mask Aligner | Equipment | Maryland NanoCenter FabLab — nanocenter.umd.edunanocenter.umd.edu
- [14]Lithography — nanolab.berkeley.edunanolab.berkeley.edu
- [15]Tool Details - Harvard CNS — cns1.rc.fas.harvard.educns1.rc.fas.harvard.edu
- [16]Mask Aligner | Shared Materials Instrumentation Facility — smif.pratt.duke.edusmif.pratt.duke.edu
- [17]User Manual — epfl.chepfl.ch
- [18]Karl Suss MA6 Aligner | UCLA Nanolab — nanolab.ucla.edunanolab.ucla.edu
- [19]Suss MA6 Mask Aligner (system 2) — tmi.utexas.edutmi.utexas.edu
- [20]Manual — ncf.uic.eduncf.uic.edu
- [21]Lithography — tudelft.nltudelft.nl
- [22]SUSS MicroTec (formerly Karl SUSS) - Industry leader in the Advanced Packaging, MEMS and semiconductor markets — suss.com (May 17, 2003)web.archive.org
Last updated Oct 6, 2026.
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