SUSS MicroTec
LabSpin6 / 8
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The LabSpin6 / 8 is a manual system for spin coating and puddle developing. The LabSpin6 / 8 handles substrates up to 200 mm.[1]
What it is
The LabSpin6 / 8 is a manual spin coating and puddle developing system from SUSS MicroTec that handles wafers up to 200 mm in diameter.[1]
How it works
The LabSpin6 / 8 performs spin coating and puddle developing operations as part of a manual process flow.[1]
What do the numbers mean?
Wafer handling1
Configuration & options2
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the LabSpin6 / 8 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the LabSpin6 / 8 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the LabSpin6 / 8 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the LabSpin6 / 8 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the LabSpin6 / 8 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the LabSpin6 / 8 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]hilpert.ch — hilpert.chhilpert.ch
Last updated Sep 22, 2026.
Compare with similar tools
View all →The HP8, CP8, and VP8 are manual coating and developing systems from SUSS MicroTec, supporting wafers up to 200 mm and offering baking, cooling, and vapor priming capabilities.
The Thermo Fisher Scientific / FEI NanoLab 1200 AT FIB is a focused ion beam system with an integrated Electron column and supporting inspection, wafer handling, and gas delivery components.
The ABM-407B-2-S-CE-S293 is a robot.