SUSS MicroTec
Gamma
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The SUSS MicroTec Gamma is an automated photoresist and wet processing system for photolithography. The Gamma performs DUV photoresist and antireflection coatings, wafer baking, developing, and spray coating for conformal resist wet processing tasks. The Gamma handles wafers from 100mm through 200mm, processing different wafer sizes simultaneously without mechanical changeover.[1][2]
What it is
The SUSS MicroTec Gamma is an automated photoresist and wet processing system designed for clean, reliable and high-throughput photolithography processing.[1][2]
The Gamma system is equipped with two wafer cassette stations that accommodate wafers from 100mm through 200mm in size, allowing different wafer sizes to be processed simultaneously without any mechanical changeover.[1]
How it works
The Gamma system's configuration is tailored to perform a variety of DUV photoresist and antireflection coatings, wafer baking, developing and spray coating for conformal resist wet processing tasks.[1][2]
The coating module of the Gamma system is primarily dedicated to DUV resist and ARC processing, while manual dispensing of other resists can be arranged.[1]
The Gamma system includes a spray coating module, such as the Alta Spray module, for conformal coating on pieces up to 200mm wafers.[1]
Where it fits in the process flow
The tool supports DUV photoresist coating, antireflection coating, wafer baking, developing and spray coating, which are steps in the resist processing flow.[1][2]
The Gamma system is compatible with wafers that meet specified requirements, and the backside of wafers must be free of contamination prior to placement in the system.[1]
Applications
The Gamma system is used for DUV resist and ARC coating, wafer baking, wafer developing and conformal coating on pieces to 200mm wafers.[1]
The Gamma system processes UV-210 resist coating and baking, DUV42P ARC coating and baking, conformal resist coating with the Alta Spray module, and post exposure baking with 726 MIF developing.[1]
The Gamma is a resist coater and a spray coater, and is part of the SUSS MicroTec GAMMA family of tools.[4]
What do the numbers mean?
Wafer handling3
- Process capabilities
- DUV resist and ARC coating, wafer baking, wafer developing, conformal coating on pieces to 200mm wafers[1]
Gas & chemistry1
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- TypeCoater / Developer[3]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What wafer sizes does the SUSS MicroTec Gamma support?
The Gamma system supports wafers from 100mm through 200mm, with a maximum substrate size of 8 inches.[1][2]
Can the Gamma process different wafer sizes simultaneously?
Different wafer sizes can be processed simultaneously without any mechanical changeover.[1]
What processes does the Gamma perform?
The Gamma performs DUV resist and ARC coating, wafer baking, wafer developing and conformal coating on pieces to 200mm wafers.[1]
What specific resists and processes are available on the Gamma?
Processes available include UV-210 resist coating and baking, DUV42P ARC coating and baking, conformal resist coating with the Alta Spray module, and post exposure baking with 726 MIF developing.[1]
What are the restrictions on wafers used in the Gamma?
The Gamma is compatible with 100mm wafers standard and up to 200mm, but other size wafers must be scheduled with the equipment owners. No warped wafers are allowed, and the backside of wafers must be free of contamination.[1]
Not publicly documented
The following facts about the Gamma are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Gamma are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Gamma are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Gamma are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Gamma are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Gamma is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]cnfusers.cornell.edu — cnfusers.cornell.educnfusers.cornell.edu
- [2]nnci.net — nnci.netnnci.net
- [3]Equipment inventory listing
- [4]SUSS MicroTec GAMMA family | Waferpedia — waferpedia.comwaferpedia.com
- [5]Equipment inventory listing
Last updated Oct 5, 2026.