Plasma-Therm
SLR Series
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
The Plasma-Therm SLR Series is a plasma-enhanced chemical vapor deposition (PECVD) system used for depositing thin films in semiconductor manufacturing.[1]
How it works
General reference — not yet source-verifiedIn a PECVD system, reactive gases are introduced into a vacuum chamber where a radio-frequency (RF) plasma is ignited. The plasma creates energetic electrons and ions that dissociate the process gases into radicals and ions, which then adsorb onto the substrate surface and react to form a solid thin film. The substrate temperature is typically maintained at an intermediate level, lower than in thermal CVD, to allow deposition on temperature-sensitive materials.
Applications
General reference — not yet source-verifiedThe Plasma-Therm SLR Series in its deposition configuration is applied to the deposition of uniform thin films for microelectronic devices, MEMS, and optoelectronic components. Common materials deposited include silicon dioxide, silicon nitride, and other dielectric films used for insulation, protection, and structural layers.
What do the numbers mean?
Gas & chemistry1
Configuration & options1
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Tool typePlasma CVD (Chemical Vapor Deposition)[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What type of deposition system is the Plasma-Therm SLR Series?
The Plasma-Therm SLR Series is a plasma-enhanced chemical vapor deposition (PECVD) system, also referred to as a plasma CVD system.[1]
Not publicly documented
The following facts about the SLR Series are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the SLR Series are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SLR Series are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the SLR Series are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the SLR Series are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the SLR Series are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.comwaferpedia.com
Last updated Sep 29, 2026.
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