Perkin Elmer
2400 8 L
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Perkin Elmer 2400 8 L is a sputtering system. The Perkin Elmer 2400 8 L uses an RF 20S power supply. The Perkin Elmer 2400 8 L includes a load lock.[1][2]
What it is
The Perkin Elmer 2400 8 L is a sputtering system in the deposition category.[1][2][3]
How it works
Where it fits in the process flow
The Perkin Elmer 2400 series supports metal deposition, RF sputtering, DC sputtering, RF etch, and thin film research applications.[4]
Applications
The Perkin Elmer 2400 series is used for semiconductor metal deposition, research and development thin film deposition, RF sputter deposition, DC magnetron sputtering, RF etch applications, compound semiconductor process development, MEMS research, university laboratory applications, and optical coating research.[4]
The Perkin Elmer 2400 series supports deposition of aluminum, titanium, platinum, refractory metals, dielectric films, RF bias sputtering, and co-sputtering applications.[4]
What do the numbers mean?
Power & electrical2
- RF 20S power supply[1]
Wafer handling2
- Includes a load lock[1]
Configuration & options4
- Four target system[1]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the 2400 8 L are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 2400 8 L are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 2400 8 L are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 2400 8 L are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 2400 8 L are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 2400 8 L is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]PE 2400 8 L — Perkin Elmer | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
- [4]Refurbished Perkin-Elmer 2400-8L Sputter Deposition Semiconductor System | SemiStar — semistarcorp.comsemistarcorp.com
Last updated Oct 11, 2026.
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