Onto Innovation
The MetaPulse 200 Film Thickness Measurement is a film thickness measurement system. The MetaPulse 200 Film Thickness Measurement is a tool for 8-inch wafers. The MetaPulse 200 Film Thickness Measurement is an opaque film metrology tool for multilayer metal film stacks.[1][2][3]

The MetaPulse 200 employs picosecond ultrasonic laser sonar (PULSE Technology), a non-contact, non-destructive measurement technique based on laser-induced ultrasound. An ultrafast 800 nm laser generates acoustic pulses that propagate through the film stack; reflected echoes are detected to determine layer thicknesses and material properties.[4][3]
Year of manufacture stated as 1998.
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The following facts about the MetaPulse 200 Film Thickness Measurement are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the MetaPulse 200 Film Thickness Measurement are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MetaPulse 200 Film Thickness Measurement are not on record.
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The process node or technology generation of the MetaPulse 200 Film Thickness Measurement is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the MetaPulse 200 Film Thickness Measurement are on record.
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Last updated Oct 4, 2026.
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KLA .496 PSL Wafer is an 8-inch NIST traceable wafer stated to be capable on Surfscan 6xy0 and SP1.
The KLA .498 PSL Wafer is a NIST traceable reference wafer.