Laurell
The Laurell WS-750-23 B is a 750-series spin coater that handles maximum substrate sizes of 150mm (5" x 5"). The Laurell WS-750-23 B offers a maximum spindle speed of 12000 rpm. The Laurell WS-750-23 B is available in tabletop, in-deck, or on-deck mounting options.[1]
The WS-750-23 B has a maximum rotational speed of 12000 rpm and supports tabletop, in-deck, and on-deck mounting options.[1]
A spin coater sits in the front end of a lithography or coating flow, after substrate preparation and before soft bake and exposure or other downstream processing steps.
A resist processing spin coater is used on flat substrates that require controlled thin-film coating before later patterning or curing steps.
Spin coating is used for photoresist, polymer coatings, and other liquid films that must dry or cure as thin, uniform layers on a substrate.
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The following facts about the WS-750-23 B are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the WS-750-23 B are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the WS-750-23 B are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the WS-750-23 B are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the WS-750-23 B are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the WS-750-23 B is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 9, 2026.
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