Lam Research
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The Lam Research Rainbow 4720 is an etch tool designed for 8-inch (200mm) wafers. The Rainbow 4720 Dry variant is a dry etch system, and the Rainbow 4720 Metal Etch variant is configured for metal etch applications.[1][2]
Plasma etching systems remove material from a wafer surface through the action of chemically reactive ions generated in a low-pressure gas discharge. In a single-wafer etcher such as the Rainbow series, the wafer is placed on a powered electrode inside a vacuum chamber, and process gases are introduced and ignited into a plasma. The ions accelerated toward the wafer surface produce anisotropic etch profiles.
Metal etch is performed after metal deposition and photoresist patterning. The etch step removes unwanted metal from the wafer, leaving the desired interconnect lines. Downstream processes typically include resist stripping and subsequent dielectric deposition or passivation.
The Rainbow 4720 is used for metal etching processes.[1]
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The following facts about the Rainbow 4720 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the Rainbow 4720 are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Rainbow 4720 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Rainbow 4720 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Rainbow 4720 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Rainbow 4720 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Sep 30, 2026.
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