Lam Research
Rainbow 4400B SN2333
What it is
How it works
General reference — not yet source-verifiedPlasma etch systems generate a reactive plasma from process gases within a vacuum chamber.
The plasma contains ions and reactive radicals that remove material from the wafer surface through physical bombardment and chemical reaction.
Where it fits in the process flow
General reference — not yet source-verifiedPlasma etching is a subtractive patterning step in semiconductor manufacturing.
The etch process transfers the pattern from a photoresist or hard mask layer into an underlying thin film such as silicon dioxide, silicon nitride, or polysilicon.
Applications
General reference — not yet source-verifiedThe system is used for etching dielectric materials and conductor layers in semiconductor device fabrication.
Applications include forming contact holes, vias, and trenches for interconnect structures.
What do the numbers mean?
Wafer handling1
Configuration & options12
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the Rainbow 4400B SN2333 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Rainbow 4400B SN2333 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Rainbow 4400B SN2333 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Rainbow 4400B SN2333 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Rainbow 4400B SN2333 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Rainbow 4400B SN2333 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]dealer listingsemistarcorp.com
- [2]Lam Rainbow 4400B SN2333 | SemiStar — semistarcorp.comsemistarcorp.com
Last updated Oct 11, 2026.
Compare with similar tools
View all →The Lam Research Rainbow 4400B is a plasma etch system for 8-inch wafers.
The Lam Rainbow 4400B SN2622-Parts Machine is a plasma etch tool from Lam Research, configured as a parts machine and accepting 8-inch wafers.
The Lam Rainbow 4420 SN3675 is a plasma etch system for 8-inch wafers manufactured by Lam Research.
The Lam Rainbow 4420-Crated is a plasma etch system from Lam Research configured for 8-inch wafers.