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Gasonics L 3510 Asher / Stripper

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The Gasonics L3510 is a downstream plasma asher used for photoresist stripping and semiconductor cleaning. The Gasonics L3510 utilizes a microwave plasma source at 2.45 GHz to generate monatomic oxygen for ashing. The Gasonics L3510 supports wafer sizes from 75 mm to 200 mm.[1][2]

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Fig. — Manufacturer logo, not a photo of this toolWikimedia Commons (see file page for license)

Vacuum

0.5 to >5.0 torr[1]

Performance

45–60 WPH[1]

Gas delivery

O2, N2[1]

What it is

The Gasonics L 3510 is a downstream microwave plasma asher designed for photoresist removal. The L 3510 utilizes a patented microwave plasma source and the production-proven L-Series platform. The system supports wafer sizes up to 8 inches (200 mm).[3][1][2]

How it works

The Gasonics L 3510 generates plasma using a microwave source operating at 2.45 GHz. The downstream configuration means that plasma is created in a chamber separate from the wafer, and reactive species are transported to the wafer surface. The system includes platen and lamp heating to control wafer temperature. An integrated robotic wafer transfer system handles wafers automatically.[1][2]

Applications

The Gasonics L 3510 is used for photoresist stripping, bulk photoresist removal, implanted and damaged resist removal, descum processes, semiconductor wafer cleaning, low-damage plasma cleaning, non-oxidizing metal processing, compound semiconductor processing, and MEMS process applications. The L 3510 is also suitable for university and research institute environments, pilot production, and full-scale semiconductor fabrication.[1][2]

What do the numbers mean?

Vacuum & pumping1

Pressure Range
0.5 to >5.0 torr[1]
Accurate?

Wafer handling3

Within Wafer Uniformity
±5% to 10%[1]
Accurate?
Wafer-to-Wafer Uniformity
±5% to 10%[1]
Accurate?
Wafer Size Support
75 mm to 200 mm (3 to 8 inch)[2]
Accurate?

Gas & chemistry1

Process Gas
O2, N2[1]
Accurate?

Performance1

Throughput
45–60 WPH[1]
Accurate?

Configuration & options6

Microwave Power
0–1200 W at 2.45 GHz[1]
Accurate?
Platen Temperature
100–300°C[1]
Accurate?
Ash Rate
Up to 3.5 µm/min[1]
Accurate?
Process Type
Downstream microwave plasma ashing[2]
Accurate?
Endpint Detection
Yes, typical[2]
Accurate?
Heating
Platen and lampe heating[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • Pressure Range0.5 to >5.0 torr[1]
  • Process GasO2, N2[1]

Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What wafer sizes does the Gasonics L 3510 support?

The Gasonics L 3510 supports wafer sizes up to 8 inches (200 mm) and can handle wafers from 75 mm to 200 mm.[3][1][2]

What is the microwave power range?

The microwave power range is 0 to 1200 watts at 2.45 GHz.[1][2]

What is the ash rate?

The maximum ash rate is up to 3.5 µm/min, process dependent.[1][2]

What is the typical throughput?

Typical throughput is 45 to 60 wafers per hour, depending on the application.[1][2]

What is the platen temperature range?

The platen temperature range is 100 to 300 °C.[1][2]

Not publicly documented

The following facts about the Gasonics L 3510 Asher / Stripper are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Gasonics L 3510 Asher / Stripper are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Gasonics L 3510 Asher / Stripper are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Gasonics L 3510 Asher / Stripper are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Gasonics L 3510 Asher / Stripper are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the Gasonics L 3510 Asher / Stripper is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]allwin21.com — allwin21.comallwin21.com
  2. [2]semistarcorp.com — semistarcorp.comsemistarcorp.com
  3. [3]Equipment inventory listing
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Last updated Sep 23, 2026.

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