Lam Research
AutoEtch 590 plasma etcher plasma etch semiconductor
The Lam AutoEtch 590 is an in-line cassette to cassette, fully automated, single wafer, double air-locked, parallel plate plasma etching system. The Lam AutoEtch 590 is designed for automatic plasma etching applications with cassette-to-cassette wafer transfer capability. The Lam AutoEtch 590 supports programmable process parameters including RF power, chamber pressure, gas flow control, electrode spacing, and multi-step process recipes.[1][2][3]
Wafer size
6"
Power
ENI OEM 12[1]
What it is
The Lam Research AutoEtch 590 is a plasma etching system for semiconductor wafer processing. The AutoEtch 590 is a cassette-to-cassette, fully automated, single-wafer, double-airlocked, parallel-plate plasma etching system.[1][3][2]
How it works
The AutoEtch 590 moves a wafer from a send cassette into an entrance station, through an entrance airlock, and into the process chamber. The wafer is then etched by a computer-controlled gas plasma discharge and transferred through an exit airlock to a receive cassette.[1][2]
The AutoEtch 590 uses closed-loop automatic control. The programmable process variables include operating pressure, RF power, electrode spacing, gas flow rates, and step-terminating modes.[1][2]
Where it fits in the process flow
The AutoEtch 590 sits in the etch segment of semiconductor manufacturing, where it removes selected film material after lithography has defined the pattern on the wafer. The tool transfers wafers between cassettes and the process chamber without exposing the chamber to ambient conditions during the etch cycle.[1][2][3]
What do the numbers mean?
Power & electrical4
- Process parameters
- RF power, chamber pressure, gas flow control, electrode spacing, and multi-step process recipes[3]
Wafer handling8
Gas & chemistry1
- Gas Panel Capacity
- Five gases independently, actual capacity six gases (two may share fifth flow controller)[1]
Control & software3
Configuration & options16
Observed configurations
How individual machines were equipped when they appeared on the secondary market — as listed, per unit. These describe one specific machine, not the model in general.
Unit as listed[1]
- One chiller
- no pump
- With ENI OEM 12 RF Generator
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- ConditionAS IS condition(No chiller, no pump, With ENI OEM 12 RF Generator)[1]
- ConditionAS IS condition(One chiller, no pump, With ENI OEM 12 RF Generator)[1]
- RF GeneratorENI OEM 12[1]
- Gas Panel CapacityFive gases independently, actual capacity six gases (two may share fifth flow controller)[1]
- Process parametersRF power, chamber pressure, gas flow control, electrode spacing, and multi-step process recipes[3]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the AutoEtch 590 plasma etcher plasma etch semiconductor are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the AutoEtch 590 plasma etcher plasma etch semiconductor are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the AutoEtch 590 plasma etcher plasma etch semiconductor are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the AutoEtch 590 plasma etcher plasma etch semiconductor are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the AutoEtch 590 plasma etcher plasma etch semiconductor are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the AutoEtch 590 plasma etcher plasma etch semiconductor is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]dealer listingsemistarcorp.com
- [2]Lam AutoEtch 590 — sites.google.comsites.google.com
- [3]semistarcorp.com — semistarcorp.comsemistarcorp.com
- [4]semistarcorp.wixsite.comsemistarcorp.wixsite.com
Last updated Oct 9, 2026.
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