Lam Research
490
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Lam Research 490 is an automatic plasma etcher. The Lam Research 490 is a cassette-to-cassette system. The Lam Research 490 is configurable for 3-inch to 6-inch wafers.[1][2]
What it is
The Lam Research 490 is an etch tool.[1][4]
The Lam Research 490 is an automatic cassette-to-cassette plasma etching platform.[1][2]
How it works
Where it fits in the process flow
The Lam Research 490 supports semiconductor wafer processing applications that require stable plasma control, automated wafer handling, and repeatable process capability.[1]
Applications
The Lam Research 490 supports oxide etching, dielectric etching, thin film etching, descum processing, and related semiconductor plasma applications.[1]
The Lam Research 490 is used for semiconductor process development, university work, research institute work, MEMS processing, and compound semiconductor processing.[1]
What do the numbers mean?
Power & electrical1
Vacuum & pumping2
Wafer handling7
Gas & chemistry1
Control & software1
Configuration & options5
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What wafer size range does the Lam 490 support?
The Lam 490 is configurable for wafers from 3 inches to 6 inches; typical configurations handle 4-inch to 6-inch wafers.[1][2]
Is the Lam 490 fully automated?
Yes, it is a cassette-to-cassette automatic plasma etcher with fully automated microprocessor control.[1][2]
Does the system include endpoint detection?
Yes, endpoint detection is included.[2]
Not publicly documented
The following facts about the 490 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 490 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 490 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 490 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 490 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 490 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]semistarcorp.com — semistarcorp.comsemistarcorp.com
- [2]solutions-on-silicon.com — solutions-on-silicon.comsolutions-on-silicon.com
- [3]Equipment inventory listing
- [4]490 — Lam Research | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
Last updated Sep 30, 2026.
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