Hitachi
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The Hitachi S 4200 is a scanning electron microscope (SEM) for metrology and inspection. The Hitachi S 4200 can be equipped with an Oxford EDS for energy dispersive X-ray spectroscopy.[1][2]

The Hitachi S 4200 is a scanning electron microscope in metrology and inspection use.[1][2]
A scanning electron microscope forms images by scanning a focused electron beam across a specimen surface and collecting emitted signals from the interaction volume.
A metrology and inspection SEM is used to examine small surface features, measure critical dimensions, and inspect defects that are difficult to resolve with optical methods.
The Hitachi S 4200 fits into wafer inspection and measurement workflows after fabrication steps that create patterned surfaces.
The Hitachi S 4200 supports review of surface features and defect sites before downstream disposition, analysis, or process adjustment.
The Hitachi S 4200 is used for surface review, defect inspection, and feature measurement on semiconductor specimens.
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The following facts about the S 4200 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the S 4200 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the S 4200 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the S 4200 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the S 4200 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the S 4200 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 10, 2026.
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