EV Group
The EV Group 510 Wafer is a manual wafer load substrate bonder. The EV Group 510 Wafer is capable of fusion and thermal compression bonding. The EV Group 510 Wafer has a max bond force of 10 kN.[1][2][3]

Wafer size
Manual wafer load substrate bonder
Power
Max voltage 2 kV; max current 50 mA[3]
Vacuum
High-vacuum capable bond chamber[1]
Performance
± 1.5%[1]
The EV Group 510 Wafer is a wafer bonder for packaging and bonding applications.[2]
The EVG 510 is a manual wafer load substrate bonder with a high-vacuum capable bond chamber and Windows based control software and operation interface. The EVG 510 is a semi-automated wafer bonding system for research and low-volume production use.[1][3]
The EVG 510 supports anodic, glass frit, solder, eutectic, transient liquid phase, and direct bonding. The EVG 510 uses an easy access bond chamber and tooling design for quick retooling between wafer sizes and processes. The EVG 510 bond chamber can be configured with different tooling sets that include the wafer chuck, fixture, pressure plates, and electrodes.[3][4]
The EVG 510 applies tool force, heater temperature, chamber vacuum, and bias voltage during bonding. The EVG 510 uses separate top and bottom heaters, and the available bond settings include chamber pressure set point, temperature ramp speed, tool force, and voltage bias.[5][4]
The EVG 510 sits in the wafer bonding step after surface preparation and, when needed, after wafer alignment. The EVG 510 is part of a bonding line that also includes surface activation, wafer cleaning, pre-bond inspection, and bond alignment tools.[4]
The EVG 510 is used for bonding wafers in research, development, and low-volume production settings. The EVG 510 supports wafer stacks made from materials and surface combinations used in semiconductor and microsystem bonding flows, including silicon, glass, oxides, nitrides, polymers, metals, and eutectic metal alloys.[3][4]
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The EVG 510 supports anodic, glass frit, solder, eutectic, transient liquid phase, and direct bonding.[3]
The following facts about the 510 Wafer are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 510 Wafer are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the 510 Wafer are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the 510 Wafer are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 510 Wafer are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 510 Wafer is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 10, 2026.
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