Applied Materials
VIISta HCPi
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The VIISta HCPi is a high-current ion implanter manufactured by Applied Materials (Varian) for 300 mm wafers. The VIISta HCPi processes 12-inch (300 mm) wafers.[1][2]
What it is
How it works
General reference — not yet source-verifiedIon implanters generate a beam of ions from a source gas or solid feed material. The ions are accelerated to a desired energy, mass-filtered to select a single species, and then scanned across the wafer surface to achieve a uniform dopant distribution.
High-current implanters such as the VIISta HCPi are designed to deliver relatively high beam currents at lower energies, typically used for high-dose implant steps where throughput is critical.
Where it fits in the process flow
General reference — not yet source-verifiedThe VIISta HCPi, as a high-current implanter, is commonly used in the process flow for source/drain and poly-silicon doping steps, where high dose and moderate energy are required.
Applications
General reference — not yet source-verifiedThe VIISta HCPi is used for doping semiconductor wafers to create n-type or p-type regions in CMOS devices. Typical applications include source/drain implants, deep well implants, and threshold voltage adjustments.
As a high-current implanter, it is suited for processes requiring high dose rates, such as pre-amorphization or high-concentration doping for advanced nodes.
What do the numbers mean?
Wafer handling1
Configuration & options2
- High Current[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What wafer size does the VIISta HCPi support?
The VIISta HCPi supports 12-inch (300 mm) wafers.[1]
What is the equipment category of the VIISta HCPi?
The VIISta HCPi belongs to the ion implantation equipment category.[2]
Not publicly documented
The following facts about the VIISta HCPi are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the VIISta HCPi are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the VIISta HCPi are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the VIISta HCPi are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the VIISta HCPi are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the VIISta HCPi is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]waferpedia.com — waferpedia.comwaferpedia.com
Last updated Oct 9, 2026.
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