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Applied Materials

SEMVision G 2 CD-SEM

The Applied Materials SEMVision G 2 CD-SEM is a critical dimension scanning electron microscope. The Applied Materials SEMVision G 2 CD-SEM is used for metrology and inspection. The Applied Materials SEMVision G 2 CD-SEM is configured for 12-inch wafers.[1][2]

SEMVision G 2 CD-SEM — Inventory photo
Fig. 01SEMVision G 2 CD-SEMInventory photo[1]

What it is

The Applied Materials SEMVision G 2 is a CD-SEM for metrology and inspection. The tool is a critical dimension scanning electron microscope.[1][2]

Where it fits in the process flow

General reference — not yet source-verified

A CD-SEM sits in the metrology and inspection flow of semiconductor manufacturing. The tool is used after patterning steps to check feature dimensions and support process control.

Applications

The SEMVision G 2 is used for critical dimension measurement in semiconductor metrology. The tool also supports inspection workflows that benefit from electron-beam imaging.[1][2]

What do the numbers mean?

Wafer handling1

Wafer size
12 inch[1]
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Control & software2

HDD & Software included[1]
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HDD and software
Included[2]
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Dimensions & facilities1

Tool type
CD-SEM (Critical Dimension Scanning Electron Microscope)[2]
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Configuration & options7

With EDX (Energy Dispersive X-ray Spectroscopy)[1]
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Largest Load
8 A[1]
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Full Load Current
10 A[1]
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Manufacturer
Applied Materials[2]
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Model
SEMVision G 2[1]
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Category
Metrology & Inspection[2]
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EDX
Included[1]
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What replaced it?

Alternatives

Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What is the main difference between a CD-SEM and a regular SEM?General reference — not yet source-verified

A CD-SEM is optimized for automated, high-precision dimensional measurements of patterned semiconductor features, with built-in algorithms for edge detection and metrology. A general-purpose SEM is more flexible for imaging and analysis but lacks the specialized measurement routines, calibration schemes, and repeatability required for production-line critical-dimension control.

How does a CD-SEM avoid damaging the wafer during measurement?General reference — not yet source-verified

CD-SEMs operate with low accelerating voltages and low probe currents to minimize electron-beam-induced resist or film damage. The scanning is also controlled to limit cumulative exposure, enabling non-destructive, in-line measurements that allow wafers to continue through the fabrication process.

Is a CD-SEM used for defect detection or only for measurement?General reference — not yet source-verified

The instrument is specifically for measurement and characterization of feature dimensions, not for broad defect detection. While it may reveal local shape anomalies during measurement, dedicated optical or electron-beam inspection tools are used to find and classify randomly distributed defects across the wafer.

Not publicly documented

The following facts about the SEMVision G 2 CD-SEM are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SEMVision G 2 CD-SEM are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the SEMVision G 2 CD-SEM are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the SEMVision G 2 CD-SEM are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the SEMVision G 2 CD-SEM are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the SEMVision G 2 CD-SEM is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

No research found yet — worked with this tool? Share what you know.

Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]Inventory photo
  2. [2]waferpedia.com — waferpedia.comwaferpedia.com
  3. [3]Inventory photo
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Last updated Oct 11, 2026.

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