Applied Materials
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The Applied Materials PI 9500 XR is an ion implanter. The Applied Materials PI 9500 XR is configured with a 6-inch wheel only.[1][2]
Ion implanters accelerate ions of a chosen dopant species to a desired energy and direct them into a semiconductor wafer.
A mass analyzer filters the ion beam to select only the correct species before it is scanned across the wafer surface.
Ion implantation is a doping step that follows lithographic patterning and precedes annealing in semiconductor fabrication.
The tool is used after resist stripping and before the deposition of subsequent layers such as dielectrics or metals.
Ion implanters are used to introduce dopants into silicon wafers for creating source and drain regions in transistors.
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The following facts about the PI 9500 XR are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the PI 9500 XR are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the PI 9500 XR are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the PI 9500 XR are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the PI 9500 XR are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the PI 9500 XR are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
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Last updated Sep 16, 2026.
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
The Varian 160 XP is an ion implanter. A variant, the Varian 160 XP Ion, is configured as a 150 mm high-current implanter.
The Varian 160 XP Ion is an ion implantation tool configured as a 150mm high-current implanter.