AJA
ATC 2200
The AJA ATC 2200 is a PVD sputtering system. The AJA ATC 2200 deposits films on a substrate by sputtering. The AJA ATC 2200 supports substrates to 6 inches.[1]
Plate 01AJA ATC-2200-UHV deposition system sputtering system
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Wafer size
6"
Power
DC and RF generators[1]
What it is
The AJA ATC 2200 is a physical vapor deposition sputtering system for depositing thin films on substrates.[1]
How it works
Where it fits in the process flow
General reference — not yet source-verifiedThe AJA ATC 2200 is used after substrate preparation and before downstream patterning, annealing, or device assembly steps that use the deposited films.
The AJA ATC 2200 supports vacuum-based film deposition workflows that often require clean substrates, controlled atmosphere, and repeatable layer growth.
Applications
The AJA ATC 2200 is used for corrosion resistant coatings, low friction coatings, hard wear resistant coatings, and coatings with specific electrical and optical properties.[1]
The AJA ATC 2200 supports reactive sputtering and low pressure operation, which suit the deposition of functional thin films.[1]
- Corrosion resistant coatings
- Low friction coatings
- Hard, wear resistant coatings
- Coatings with specific electrical and optical properties
What do the numbers mean?
Power & electrical2
Vacuum & pumping3
- Gas injection
- Integral gas injection to source head for reactive sputtering and low pressure operation[1]
- Tilt adjustment
- In-situ tilt gimbals with locking UHV position indicator; allows source head angle adjustment without breaking vacuum[1]
- Reactive sputtering gas injection
- Integral gas injection to source head for reactive sputtering and low pressure operation[1]
Wafer handling2
Control & software1
Configuration & options10
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Gas injectionIntegral gas injection to source head for reactive sputtering and low pressure operation[1]
- Tilt adjustmentIn-situ tilt gimbals with locking UHV position indicator; allows source head angle adjustment without breaking vacuum[1]
- Power sourcesDC and RF generators[1]
- Reactive sputtering gas injectionIntegral gas injection to source head for reactive sputtering and low pressure operation[1]
- Power suppliesDC and RF generators[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Can the substrate be heated during deposition?
Yes, the system has radiant heating with quartz halogen lamps capable of reaching temperatures up to 800 °C.[1]
What power supplies are available on the AJA ATC 2200?
The system is equipped with both DC and RF generators.[1]
Does the system include an ion source for pre-cleaning or assisted deposition?
Yes, it includes a Kaufman KDC 40 4cm gridded ion source.[1]
Not publicly documented
The following facts about the ATC 2200 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the ATC 2200 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the ATC 2200 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the ATC 2200 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the ATC 2200 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the ATC 2200 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (3)Every fact above is drawn from these public sources
- [1]pnf.uchicago.edu — pnf.uchicago.edupnf.uchicago.edu
- [2]Sputter 4 (AJA ATC 2200-V) - UCSB Nanofab Wiki — wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
- [3]Batch Coater Sputter Systems — ajaint.com (Sep 22, 2023)web.archive.org
Last updated Oct 3, 2026.
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