Waferpedia

Tool family

Tokyo Electron Formula Vertical

Models in this family

  1. The Tokyo Electron Formula Vertical is a vertical diffusion furnace used for thermal processing and chemical vapor deposition (CVD) on 300 mm wafers, with available process variants including silicon nitride, DCS/NH3/HF/F2, and TEOS/HF/F2.

    Cited variants

    DesignationGenerationVintageChangesSource
    FORMULA VERTICAL FURNACE, ALD HIGH K(H TYPE) PROCESS——configured for ALD high-k (H type) processfabsurplus.com[1]
    FORMULA VERTICAL FURNACE, DCS SiN PROCESS——configured for DCS SiN (silicon nitride) processfabsurplus.com[1]
    FORMULA Vertical Furnace, DCS/NH3/HF/F2——configured for DCS/NH3/HF/F2 chemistryfabsurplus.com[2]
    FORMULA VERTICAL FURNACE, TEOS/HF/F2 PROCESS——configured for TEOS/HF/F2 processfabsurplus.com[1]
    FORMULA VERTICAL FURNACE, DCS SiN(H TYPE) PROCESS——configured for DCS SiN (H type) processfabsurplus.com[1]
    FORMULA VERTICAL FURNACE, DCS SiN(M TYPE) PROCESS——configured for DCS SiN (M type) processfabsurplus.com[1]
    FORMULA VERTICAL FURNACE, H TYPE PROCESS——configured for H type processfabsurplus.com[1]
    FORMULA VERTICAL FURNACE, Teos(H TYPE) PROCESS——configured for Teos (H type) processfabsurplus.com[1]

Sources

Sources (2)Every fact above is drawn from these public sources
  1. [1]fabsurplus.comfabsurplus.com
  2. [2]fabsurplus.comfabsurplus.com