Tool family
The Ontrak DSS 200 is a double-sided PVA scrubber designed to clean wafers ranging from 100mm to 200mm.
Cited variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| DSS 200 Series 1 | — | — | Base variant; double-sided PVA scrubber for 100-200mm wafers. | axustech.com[1] |
| DSS 200 Series 2 | — | — | Offers throughput of 45-65 wafers per hour, dark plastic covers to protect light-sensitive wafers. | axustech.com[2] |
| DSS 200 Series 2 CE | — | — | Cleaning method: brush scrub; brush type: roller PVA; downforce control: yes; edge scrub: optional; megasonic: optional; drying: spin + heat lamp; NH4OH: yes; dHF: no; SC-1 pre-diluted: yes; SC-2: citric-based; backside chemical: yes; metal CMP cleans: yes; STI CMP cleans: yes; double contained process area: no. | entrepix.com[3] |
| DSS 200 Synergy | — | — | Cleaning method: brush scrub; brush type: roller PVA; downforce control: yes; edge scrub: optional; megasonic: optional; drying: spin + heat lamp; NH4OH: yes; dHF: yes; SC-1 pre-diluted: yes; SC-2: citric OR HCL-based; backside chemical: yes; metal CMP cleans: yes; STI CMP cleans: yes; double contained process area: yes. | entrepix.com[3] |
| DSS 200 Integra | — | — | Cleaning method: brush scrub; brush type: roller PVA; downforce control: yes; edge scrub: optional; megasonic: optional; drying: spin + heat lamp; NH4OH: yes; dHF: yes; SC-1 pre-diluted: yes; SC-2: citric OR HCL-based; backside chemical: yes; metal CMP cleans: yes; STI CMP cleans: yes; double contained process area: yes; integrated megasonic. | entrepix.com[3] |