Waferpedia

Comparison ledger

CV100PLversusCV100PZ

YES CV100PL, YES CV100PZ, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMYESYES
CategorySingle Wafer Resist StripperSingle Wafer Resist Stripper
Wafer size2 to 6 in.6-8 in. (Auto Detect)
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyYES CV100PLYES CV100PZ
Cited variants—
  • YES-CV108[1]
  • YES-CV100PL-APS[1]
Specifications
ModelYES-CV100PL - APS[2]YES-CV100PZ[1]
CategorySingle Wafer Resist Stripper[3]—
Wafer size2 to 6 in.[2]6-8 in. (Auto Detect)[1]
Strip rateup to 15,000 Å/min[2]up to 20,000 Å/min[1]
Electron shift in 200Å gate oxide< 10 mV[2]—
Automationfully automated; automatic, robotic, cassette-to-cassette loading[2]—
Controllertouchscreen interfaced PLC controller[2]—
CommunicationRS232 communication standard[2]—
End point detection—Patented Gas Swirl End Point Detection of Resist and Polymide Removal[1]
Controls—Mass Flow Controllers; PLC Control / Touchscreen Interface[1]

Plan your fab

Building a Single Wafer Resist Stripper process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.org
  3. [3]web.archive.orgweb.archive.org