Comparison ledger
SUSS MicroTec 150 e Mask, SUSS MicroTec MA 8 BA 8 Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | MA 8 BA 8 MaskSUSS MicroTec |
|---|---|---|
| OEM | SUSS MicroTec | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | High precision micrometer for wafer alignment adjustment |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec 150 e Mask | SUSS MicroTec MA 8 Mask |
| Specifications | ||
| Configuration | — | Backside Optical Alignment[1] |
| Wafer Loading | — | Manual loading & unloading[1] |
| Microscope Lenses | — | 2× 5× lenses, 2× 10× lenses[1] |
| Power | — | 1000 W UV mercury lamp[1] |
| Wafer size | — | High precision micrometer for wafer alignment adjustment[1] |
| Micrometer axes | — | X / Y / θ (theta)[1] |
| X / Y minimal travel | — | 10 mm[1] |
| θ-axis maximum rotation angle | — | ±5°[1] |
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