Waferpedia

Comparison ledger

SU 3200versus1000P

SCREEN SU 3200, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
SU 3200SCREEN
OEMSCREENYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1998 Acquisition
Control system——
Generation——
FamilySCREEN SU 3200YES 1000P
Specifications
ConfigurationChemicals Used: - H3PO4 (Phosphoric Acid) - IPA (Isopropyl Alcohol) - H2O2 (Hydrogen Peroxide) - TM-Y Chemical Tanks / Channels: - 12 channels FOUP Ports: - 4[1]Parallel plate[5]
MakeSCREEN / DNS[1]—
ModelSU 3200[1]1000P[4]
Tool typesingle-wafer cleaner[2]—
Wafer size12 inch (300 mm)[3]—
Maximum throughputup to 800 wafers per hour[3]—
Maximum chambersup to 12 chambers[3]—
Chamber arrangement12 chambers in four three-level towers[3]—
Wafer handlerKawasaki robot[3]—
Chemical supply systemdynamic direct injection (DDI) or cabinet-type chemical supply system[3]—
Communication protocolSECS/GEMS[3]—
Software versionP2485STD00V2485STD00[3]—
Power rating208AC-3 Phase[3]—
Chemicals usedH3PO4 (Phosphoric Acid), IPA (Isopropyl Alcohol), H2O2 (Hydrogen Peroxide), TM-Y[1]—
Chemical tanks / channels12 channels[1]—
FOUP ports4[1]—
System type—Plasma cleaning system[4]
Shelf configuration—Four 16 x 16 inch shelves[4]
Total capacity—1024 square inches[4]
Control system—PLC driven with plain English real time process readout and diagnostics in the event of system abort[4]
Number of shelves—4[4]
Shelf size—16 x 16 inches[4]
Power—1000 W[5]
Operation modes—Active, RIE, Downstream[4]
Sample size range—From smallest semiconductor chip to large flat panels[4]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]waferpedia.comwaferpedia.com
  4. [4]web.archive.orgweb.archive.org
  5. [5]semistarcorp.comsemistarcorp.com