Comparison ledger
Nikon NSR S 307 E, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NSR S 307 ENikon | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | Wafer X-Axis is out of order | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Wafer | 300 mm[1] | — |
| Exposure Light Source | ArF excimer laser[1] | — |
| Wavelength | 193[1] | — |
| Resolution | 80 nm[2] | — |
| Alignment Accuracy | 12 nm[1] | — |
| Exposure Field | 26 x 33 mm[1] | — |
| Reduction Ratio | 1:4[1] | — |
| Wafer size | Wafer X-Axis is out of order[1] | — |
| Configuration | Hard Disk, 300mm[3] | — |
| Light Source | ArF excimer laser[1] | — |
| Lens NA | 0.85[2] | — |
| Lens Data | Cymer XLA 140[3] | — |
| Wafer Size Support | 200 mm / 300 mm[2] | — |
| Throughput (300 mm) | > 112 WPH[2] | — |
| Throughput (200 mm) | > 160 WPH[2] | — |
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