Comparison ledger
Lam Research Alliance 6 9400 PTX, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Alliance 6 9400 PTXLam Research | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Alliance | Oxford Instruments 100 ICP Fluorine |
| Specifications | ||
| Configuration | 3 Chamber[1] | — |
| Voltage | 208 VAC[2] | — |
| Full Load Current | 43 Amps[2] | — |
| Capacity of Main Breaker | 10 kA[2] | — |
| Wafer Size | 8 inch[1] | — |
| Number of Chambers | 3 Chamber[1] | — |
| Frequency | 50/60 Hz[2] | — |
| Operating System | Upgraded to Windows 7[2] | — |
| Endpoint Detection | OES (Optical Emission Spectroscopy)[2] | — |
| Chamber Type | Poly Etch Chambers[2] | — |
| Number of Poly Etch Chambers | All 3[2] | — |
| Vintage | 2000[2] | — |
| Asset # | 132832[3] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[4] |
| Cryo DRIE etch rate | — | up to 5 µm/min[4] |
| Wafer size | — | 4 inch, 6 inch, 8 inch (with clamp change)[4] |
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